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Ramon Walter

Advanced Lithography Methods and Hydrogen Sensing
4th Physics Institute


+49 711 685-64956 | Lab: +49 711 685 64531/69840/64533
+49 711 685-60397

Pfaffenwaldring 57
70569 Stuttgart
Room: 4-514 | Lab: 4-323/4-527


Advanced Lithography Methods and Hydrogen Sensing

  • Low-cost hydrogen sensor in the ppm range with purely optical read-out
    E. Herkert, F. Sterl, N. Strohfeldt, R. Walter, and H. Giessen
    ACS Sens. 5, 978 (2020)
  • Magnesium as Novel Material for Active Plasmonics in the Visible Wavelength Range
    F. Sterl, N. Strohfeldt, R. Walter, R. Griessen, A. Tittl, and H. Giessen
    Nano Lett. 15, 7949 (2015)
  • Large-Area Fabrication of TiN Nanoantenna Arrays for Refractory Plasmonics in the Mid-Infrared by Femtosecond Direct Laser Writing and Interference Lithography
    S. Bagheri, C. M. Zgrabik, T. Gissibl, A. Tittl, F. Sterl, R. Walter, S. De Zuani, A. Berrier, T. Stauden, G. Richter, E. L. Hu, and H. Giessen
    Opt. Mater. Express 5, 2625 (2015)
  • Large-Area low-cost tunable plasmonic perfect absorber in the near-infrared by colloidal etching lithography
    R. Walter, A. Tittl, A. Berrier, F. Sterl, T. Weiss, and H. Giessen
    Adv. Opt. Mater. 3, 398 (2015)
  • Quantitative angle-resolved small-spot reflectance measurements on plasmonic perfect absorbers: impedance matching and disorder effects
    A. Tittl, M. Harats, R. Walter, X. Yin, M. Schäferling, N. Liu, R. Rapaport, and H. Giessen
    ACS Nano 8, 10885 (2014)
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