November 2, 2017 /

New process equipment funded by the European Union via the EFRE program, the State of Baden-Württemberg, and the DFG

Atomic Layer Deposition of Dielectrics

Novel applications in nano-optics and plasmonics require the conformal coating of complex two- and three-dimensional components with dense and fully closed dielectric and metallic films with precisely controllable thickness. So-called atomic layer deposition (ALD) allows for the growth of individual monolayers using gaseous precursors. These substances can penetrate the sample completely and therefore also deposit material in shaded areas. Due to the atomic layer-by-layer coating, extremely precise layer thickness control in the nm range is inherent in the process. In addition to dielectrics, metals and metal compounds can also be applied. These new types of thin film materials enable the structuring of complex two- and three-dimensional micro- and nanostructures on an unprecedented level and enable completely new imaging systems and optics.

 

 

The 4th Physics Institute gratefully acknowledges the support from the EU via EFRE, the State of Baden-Württemberg, and the DFG

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