August 15, 2019 /

Atomic Layer deposition tool is operational

Our Atomic Layer deposition tool is operational. This advanced deposition technique allows us to conformably coat samples with dense and fully closed dielectric films. Gaseous precursors are sequentially injected into the process chamber and lead to a monolayer-wise growth of the films on every accessible surface. We are able to deposition low- and high refractive index materials including SiO2, TiO2, HfO2, and alumina (Al2O3).We gratefully acknowledge financial support by the European Union via the EFRE program, the State of Baden-Württemberg, and the DFG.

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