Ramon Walter, M.Sc.
University of Stuttgart
4th Physics Institute
Office: +49 711 685 64956
Lab: +49 711 685 64531/69840/64533
Fax: +49 711 685 60397
Research field: Cleanroom facilities and advanced lithography methods
- Magnesium as Novel Material for Active Plasmonics in the Visible Wavelength Range
F. Sterl, N. Strohfeldt, R. Walter, R. Griessen, A. Tittl, and H. Giessen
Nano Lett. 15, 7949 (2015).
This article appeared on the cover of the December issue of Nano Letters.
- Large-Area Fabrication of TiN Nanoantenna Arrays for Refractory Plasmonics in the Mid-Infrared by Femtosecond Direct Laser Writing and Interference Lithography
S. Bagheri, C. M. Zgrabik, T. Gissibl, A. Tittl, F. Sterl, R. Walter, S. De Zuani, A. Berrier, T. Stauden, G. Richter, E. L. Hu, and H. Giessen
Opt. Mater. Express 5, 2625 (2015).
This paper has been highlighted in the OSA Spotlight on Optics. Please have also a look at the spotlight summary by Brad Deutsch. Additionally, this paper was the second most downloaded article in Optical Materials Express in December 2015 and amongst the most downloaded articles in November 2015 and January 2016.
- Large-Area low-cost tunable plasmonic perfect absorber in the near-infrared by colloidal etching lithography
R. Walter, A. Tittl, A. Berrier, F. Sterl, T. Weiss, and H. Giessen
Adv. Opt. Mater. 3, 398 (2015).
This article has been selected for the Best of Advanced Optical Materials – 2015 edition.
- Quantitative angle-resolved small-spot reflectance measurements on plasmonic perfect absorbers: impedance matching and disorder effects
A. Tittl, M. Harats, R. Walter, X. Yin, M. Schäferling, N. Liu, R. Rapaport, and H. Giessen
ACS Nano 8, 10885 (2014).