February 18, 2020

Save the date – another European nanolithography symposium coming up
This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology, Genysis and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities.

Time: February 18 – 19, 2020
Registration close: February 6, 2020
Lecturer: Christina Wagner
Venue: Universität Stuttgart
4th Physics Institute and Research Center SCoPE
Hörsaal V57.02 & Raum 2.136
Pfaffenwaldring 57
70569  Stuttgart
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Don’t miss your chance to discuss the latest developments in nanolithography and listen to talks covering many different facets of the subject. Customers will speak about their work in lithography, highlighting various aspects of the field. Further talks will be given by the participating companies microresist, nanoscribe, Heidelberg Instruments, Genysis, and Raith, presenting the spectrum of latest state-of-the-art direct write capabilities.

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